METHOD AND SYSTEM FOR ELECTRON DENSITY MEASUREMENT

摘要

The present invention provides a diagnostic system for plasma processing (1), wherein the diagnostic system (1) comprises a multi¬ modal resonator (35), a power source (60), a detector (70), and a controller (80). The controller (80) is coupled ot hte power source (60) and the detector (70), and it is configured to provide a man-machine interface (82) for performing several monitoring and controlling functions associated with the diagnostic system (1) including: a Gunn diode voltage monitor, a Gunn diode current monit a varactor diode voltage monitor, a detector voltage monitor, a varactor voltage control, a varactor voltage sweep control, a resonanc lock-on control, a graphical user control, and an electron density monitor. The diagnostic system (1) can further provide a remote controller (84) coupled to the controller (80) and configured to provide a remote man-machine interface (86). The remote man-mach interface (86) can provide a graphical user interface in order to permint remote control of the diagnostic system (1) by an operator. I addition, the present invention provides several methods of controlling the diagnostic system (1) in order to perform both monitor an control functions.