| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum processor which more effectively suppresses advance of a foreign matter rebounded from a turbo molecular pump, does not degrade the yield of a sample, and has structure easy in cleaning. SOLUTION: In the vacuum processor having coaxial exhausting structure which has: a processing chamber 20 which is arranged in a vacuum container 11 and in the inside of which plasma is formed; a sample base 19 which is arranged at a lower part of the inside of the processing chamber 20 and on the upper surface of which a sample W for processing is loaded; a gas introduction mechanism 13 which is arranged at an upper part of the processing chamber 20 and has an introduction hole for introducing gas for processing in the processing chamber; a pressure control mechanism 24 which is arranged at a lower part in the inside the processing chamber and controls pressure in the inside of the processing chamber; and the turbo molecular pump 25 for exhausting the inside of the processing chamber, wherein the turbo molecular pump 25 is installed at a lower part of the sample base 19, two or more boards 31, 32 are alternately installed in an exhaust path formed between a wall surface on the inside of the processing chamber 20 and a peripheral side wall surface of the sample base 19. COPYRIGHT: (C)2009,JPO&INPIT
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