| 摘要 |
In a method for operating an illumination system (12) of a microlithographic projection exposure apparatus (10), a set of illumination parameters that describe properties of a light bundle which converges at a point (72) on a mask (14) to be illuminated by the illumination system (12), is first determined. Optical elements (26, 36, 44, 46, 74, 76) whose optical effect on the illumination parameters can be modified as a function of control commands are furthermore determined, as well as sensitivities with which the illumination parameters react to an adjustment of the optical elements, induced by the control commands. The control commands are then determined while taking the previously determined sensitivities into account, such that deviations of the illumination parameters from predetermined target illumination parameters satisfy a predetermined minimisation criterion. These control commands are applied to the optical elements, before the mask (14) is illuminated. |
