| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition and the like having excellent plating resistance, while provided with preservability. <P>SOLUTION: The photosensitive composition contains a binder, a photopolymerization initiator, a polymerizable compound having at least one unsaturated double bond, at least one of a dicyandiamide and a dicyandiamide derivative, and at least one of benzotriazole and a benzotriazole derivative, and contains no epoxy resin. An I/O value of the binder is preferably ≤0.8. An acrylic equivalent is preferably ≥100 in the polymerizable compound having at least one unsaturated double bond. The photopolymerization initiator is preferably an oxime derivative. <P>COPYRIGHT: (C)2009,JPO&INPIT |
