发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which can make smooth shift from a development stage to a mass-production stage and enables the productivity thereof to be improved. SOLUTION: The substrate processing apparatus 11 is used to manufacture an organic EL device, a liquid crystal device, a semiconductor device, etc., each having a substrate 12 to be processed. The substrate processing apparatus 11 has a first processing chamber 13a to a fifth processing chamber 13e, and a conveyance chamber 14 and, for example, the processing chambers 13a to 13e are arranged linearly along a side surface of the conveyance chamber 14. Each of the processing chambers 13a to 13e can deliver and receive the substrate 12 to and from the conveyance chamber 14 through first gate valves 15. Further, each of the processing chambers 13a to 13e is connected to its adjacent processing chambers 13 through second gate valves 16. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009200078(A) 申请公布日期 2009.09.03
申请号 JP20080036961 申请日期 2008.02.19
申请人 SEIKO EPSON CORP 发明人 NAONO HIDEAKI
分类号 H01L21/677;H01L21/205 主分类号 H01L21/677
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