GAS FLOW EQUALIZER PLATE SUITABLE FOR USE IN A SUBSTRATE PROCESS CHAMBER
摘要
A flow equalizer plate is provided for use in a substrate process chamber. The flow equalizer plate has an annular shape with a flow obstructing inner region, and a perforated outer region that permits the passage of a processing gas, but retains specific elements in the processing gas, such as active radicals or ions. The inner and outer regions have varying radial widths so as to balance a flow of processing gas over a surface of a substrate. In certain embodiments, the flow equalizer plate may be utilized to correct chamber flow asymmetries due to a lateral offset of an exhaust port relative to a center line of a substrate support between the process volume and the exhaust port.
申请公布号
WO2009108568(A2)
申请公布日期
2009.09.03
申请号
WO2009US34533
申请日期
2009.02.19
申请人
APPLIED MATERIALS, INC.;BALAKRISHNA, AJIT;RAUF, SHAHID;NGUYEN, ANDREW;WILLWERTH, MICHAEL D.;TODOROW, VALENTIN D.
发明人
BALAKRISHNA, AJIT;RAUF, SHAHID;NGUYEN, ANDREW;WILLWERTH, MICHAEL D.;TODOROW, VALENTIN D.