发明名称 PHOTOPOLYMER COMPOSITION SUITABLE FOR LITHOGRAPHIC PRINTING PLATES
摘要 <p>Radiation-sensitive element comprising (a) a substrate and (b) a radiation-sensitive coating comprising (i) at least one component selected from photoinitiators and sensitizer/coinitiator systems which absorbs radiation of a wavelength in the range of 250 to 1,200 nm; (ii) at least one oligomer A of formula (I) wherein X1, X2 and X3 are independently selected from straight-chain or cyclic C4-C12 alkylene and C6-C10 arylene, a heterocyclic group, a heteroaromatic group and combinations of two or more of the above, R1, R2 and R3 are independently selected from (II) and (III) with the proviso that (1) n=0 in at least one of the groups R1, R2 and R3, and (2) n>2 in at least one of the groups R1, R2 and R3, and (3) at least one group R6 is different from H in formula (III).</p>
申请公布号 EP1910896(B1) 申请公布日期 2009.09.02
申请号 EP20060762358 申请日期 2006.07.03
申请人 EASTMAN KODAK COMPANY 发明人 BAUMANN, HARALD;STREHMEL, BERND;PIETSCH, DETLEF;DWARS, UDO;EBHARDT, TANJA;DRABER, AXEL
分类号 G03F7/027;B41M5/40 主分类号 G03F7/027
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