发明名称 Process for the manufacture of at least one ethylene derivative compound
摘要 <p>Process for the manufacture of at least one ethylene derivative compound starting from a low value residual gas, preferably a ROG, according to which : a) the low value residual gas is subjected to a series of treatment steps in a low value residual gas recovery unit in order to remove the contaminants present therein and to obtain a mixture of products containing ethylene and other constituents; b) the said mixture of products is separated into a fraction enriched with compounds which are lighter than ethylene, containing part of the ethylene (fraction A), into a fraction enriched with ethylene (fraction B) and into a heavy fraction (fraction C); c) fraction A and fraction B are conveyed to the manufacture of at least one ethylene derivative compound.</p>
申请公布号 EP2096095(A1) 申请公布日期 2009.09.02
申请号 EP20080152103 申请日期 2008.02.28
申请人 SOLVAY (SOCIETE ANONYME) 发明人
分类号 C07C7/00;C07C17/02;C07C17/156;C07C19/045 主分类号 C07C7/00
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