发明名称 |
COMPOSITIONS DOPANTES POUR SEMI-CONDUCTEURS ( |
摘要 |
The disclosure herein relates to semiconductor doping compositions and to methods for their preparation and use. More particularly, the disclosure relates to liquid silica-based doping compositions which may be applied to a surface of a semiconductor substrate and, upon heating, an impurity is diffused from a film of the doping composition into the substrate to form a region therein having the desired electrical properties. |
申请公布号 |
BE771466(A1) |
申请公布日期 |
1972.02.18 |
申请号 |
BE19710771466 |
申请日期 |
1971.08.18 |
申请人 |
MONSANTO CY, 800 NORTH LINDBERGH BOULEVARD ST. LOUIS, MISSOURI63166 (E.U.A.), |
发明人 |
J.G. SCHMIDT;J.G. SCHMIDT. |
分类号 |
H01L21/22;H01L21/225;H01L21/316;(IPC1-7):01J/ |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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