发明名称 Iterative learning for position control in an exposure apparatus
摘要 A position control apparatus includes a detecting unit (1) configured to detect a position of a control target, a subtracting unit (2) configured to subtract an output of the detecting unit from a target value, an iterative learning control circuit (6) including a filter into which a deviation between the output of the detecting unit (1) and the target value is input, where the iterative learning control circuit (6) feeds forward a control input to the control target, and a parameter computing unit (Z) configured to compute a variation in a parameter of the control target. A characteristic of the filter is computed in accordance with the variation in the parameter of the control target.
申请公布号 EP2096494(A1) 申请公布日期 2009.09.02
申请号 EP20090002581 申请日期 2009.02.24
申请人 CANON KABUSHIKI KAISHA 发明人 TAKAGI, KIYOSHI
分类号 G03F7/20;G05B13/02;G05B19/00 主分类号 G03F7/20
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