发明名称 EXPOSURE PHOTOMETRY SYSTEM FOR PHOTOGRAPHIC CAMERA
摘要 Exposure photometry system of photographic equipment provided with a light-receiving portion of exposure meter passing through at least a part of the photographic optical system. When obtaining an exposure for an aperture smaller than a specified aperture of the photographic optical system, the light is measured in like manner to full-open photometry by letting the light passing through said specified aperture be accepted by the light-receiving portion. On the other hand, when obtaining an exposure for an aperture larger than said specified aperture, the light passing through said larger aperture is accepted by the light-receiving portion of the exposure meter.
申请公布号 US3646861(A) 申请公布日期 1972.03.07
申请号 USD3646861 申请日期 1969.12.23
申请人 NIPPON KOGAKU KK. 发明人 TATSUO FUJII
分类号 G03B7/00;(IPC1-7):G03B7/04 主分类号 G03B7/00
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