| 摘要 |
<p>A plasma-enhanced chemical vapor deposition (PECVD) system comprises a process module which has a housing, in which multiple process chambers (1 ) are provided. The housing of the process module is connected with a first vacuum system, and the reaction chamber body of each process chamber (1) is connected with a second vacuum system. The first vacuum system and the second vacuum system are independent of each other and can be adjusted separately.</p> |
