发明名称 NANOWIRE STRUCTURE HAVING EXPOSED, REGULARLY ARRANGED NANOWIRE ENDS AND METHOD FOR PRODUCING SUCH A STRUCTURE
摘要 The invention relates to a structure comprising nanowires that extend parallel to each other and that are made of a semiconductor material, the structure having at least one flat side having exposed, regularly arranged nanowires and having at least one macroporous stabilizing layer that is made of the same semiconductor material and that is penetrated perpendicularly by the nanowires, wherein the exposed nanowire ends protrude beyond the stabilizing layer by less than 100 µm.
申请公布号 WO2011066818(A1) 申请公布日期 2011.06.09
申请号 WO2010DE01353 申请日期 2010.11.22
申请人 CHRISTIAN ALBRECHTS UNIVERSITAET ZU KIEL;FOELL, HELMUT;CARSTENSEN, JUERGEN;BAHR, JOERG;OSSEI-WUSU, EMMANUEL 发明人 FOELL, HELMUT;CARSTENSEN, JUERGEN;BAHR, JOERG;OSSEI-WUSU, EMMANUEL
分类号 H01L29/06;B82Y10/00;B82Y40/00;H01M10/0562 主分类号 H01L29/06
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