| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which enables to form an interlayer insulating film, a protective film and a spacer by itself and can achieve high sensitivity, high flatness, high adhesion and high transmittance of the interlayer insulating film and the protective film, and high resolution and high sensitivity of the spacer, and which in the forming process, can prevent the contamination of a baking furnace and the contamination of a photomask during exposure because a photopolymerization initiator having low sublimability is used. <P>SOLUTION: The radiation-sensitive resin composition comprises (A) a polymer having a carboxyl group and at least one selected from an epoxy group and a (meth)acryloyl group, (B) a polymerizable unsaturated compound, and (C) a radiation-sensitive polymerization initiator represented by general formula (1). <P>COPYRIGHT: (C)2011,JPO&INPIT |
