发明名称 THIN FILM TRANSISTOR AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a thin film transistor in which an off current is reduced. SOLUTION: A thin film transistor has: a gate electrode 2 formed on a substrate 1; a silicon nitride film 3 formed so as to cover the gate electrode 2; a microcrystal Si semiconductor layer 4 formed on the silicon nitride film 3 and made of microcrystal silicon; and a source electrode 5 and a drain electrode 6 formed so as to contact with the microcrystal Si semiconductor layer 4. A channel region 11 is formed in a region superimposed with the gate electrode 2 of the microcrystal Si semiconductor layer 4, and a hydrogen plasma process is performed to the microcrystal silicon of the channel region 11. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011114082(A) 申请公布日期 2011.06.09
申请号 JP20090267858 申请日期 2009.11.25
申请人 SHARP CORP 发明人 MIYAZAKI ATSUSHI
分类号 H01L21/336;H01L29/786 主分类号 H01L21/336
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