发明名称 MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD
摘要 The present invention provides a measurement apparatus which measures an imaging performance of an optical system to be measured, the apparatus including a first reference substrate which is placed on an object plane of the optical system to be measured, and has periodic patterns arranged in accordance with a plurality of object heights, a second reference substrate which is placed on an image plane of the optical system to be measured, and has apertures which pass light from the periodic patterns, a detection unit configured to detect an intensity of the light which comes from the periodic patterns and has passed through the apertures, a driving unit configured to drive at least one of the first reference substrate and the second reference substrate, and a processing unit configured to perform a process for obtaining the imaging performance of the optical system to be measured.
申请公布号 US2011134408(A1) 申请公布日期 2011.06.09
申请号 US20100941368 申请日期 2010.11.08
申请人 CANON KABUSHIKI KAISHA 发明人 KURAMOTO YOSHIYUKI
分类号 G03B27/54;G01B11/24 主分类号 G03B27/54
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