发明名称 DONOR SUBSTRATE, PATTERNING METHOD, AND METHOD FOR PRODUCING DEVICE
摘要 Disclosed is a donor substrate comprising a base, a photothermal layer and a transfer prevention layer, which are formed on the base, and a transfer material layer formed on the photothermal layer and the transfer prevention layer, wherein a transfer area and a non-transfer area are formed by combinations of the photothermal layer and the transfer prevention layer, and the transfer material layer is formed on the entirety of the transfer area and at least a part of the non-transfer area. A patterning method and a device production method, wherein a large and high-precision fine patterning can be formed at low cost, without deteriorating the property of a thin film which constitutes a device such as an organic EL element, are provided.
申请公布号 WO2011068111(A1) 申请公布日期 2011.06.09
申请号 WO2010JP71431 申请日期 2010.12.01
申请人 TORAY INDUSTRIES, INC.;FUJIMORI, SHIGEO;TANIMURA, YASUAKI;NISHIMURA, SEIICHIRO 发明人 FUJIMORI, SHIGEO;TANIMURA, YASUAKI;NISHIMURA, SEIICHIRO
分类号 H05B33/10;H01L51/50 主分类号 H05B33/10
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