发明名称 Nanodrahtstruktur mit freiliegenden, regelmäßig angeordneten Nanodrahtenden und Verfahren zur Herstellung einer solchen Struktur
摘要 The invention relates to a structure comprising nanowires that extend parallel to each other and that are made of a semiconductor material, the structure having at least one flat side having exposed, regularly arranged nanowires and having at least one macroporous stabilizing layer that is made of the same semiconductor material and that is penetrated perpendicularly by the nanowires, wherein the exposed nanowire ends protrude beyond the stabilizing layer by less than 100 µm.
申请公布号 DE102009056530(A1) 申请公布日期 2011.06.09
申请号 DE20091056530 申请日期 2009.12.04
申请人 CHRISTIAN-ALBRECHTS-UNIVERSITAET ZU KIEL 发明人 FOELL, HELMUT;CARSTENSEN, JUERGEN;BAHR, JOERG;OSSEI-WUSU, EMMANUEL
分类号 B82B1/00;B82B3/00 主分类号 B82B1/00
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