发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
摘要 |
A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.
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申请公布号 |
US2011134405(A1) |
申请公布日期 |
2011.06.09 |
申请号 |
US20080809427 |
申请日期 |
2008.12.19 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BANINE VADIM YEVGENYEVICH;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;SOER WOUTER ANTHON |
分类号 |
G03B27/54;H01J7/24;H05B31/26 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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