发明名称 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
摘要 A radiation source is configured to generate radiation. The radiation source includes a first electrode and a second electrode configured to produce an electrical discharge during use to generate radiation-emitting plasma from a plasma fuel. The radiation source also includes a fuel supply configured to supply a plasma fuel to a fuel release area that is associated with the first electrode and the second electrode, and a fuel release configured to induce release of fuel, supplied by the fuel supply, from the fuel release area. The fuel release area is spaced-apart from the first electrode and from the second electrode.
申请公布号 US2011134405(A1) 申请公布日期 2011.06.09
申请号 US20080809427 申请日期 2008.12.19
申请人 ASML NETHERLANDS B.V. 发明人 BANINE VADIM YEVGENYEVICH;VAN HERPEN MAARTEN MARINUS JOHANNES WILHELMUS;SOER WOUTER ANTHON
分类号 G03B27/54;H01J7/24;H05B31/26 主分类号 G03B27/54
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