发明名称 |
METHOD FOR FORMING A SEMICONDUCTOR LAYER AND FABRICATING LIGHT EMITTING DEVICE |
摘要 |
<p>PURPOSE: A method for forming a semiconductor layer and a method for manufacturing a light emitting device are provided to reduce dislocation in a semiconductor layer of a chip region by concentrically distributing the dislocation on a semiconductor layer of a scribing region. CONSTITUTION: A growth substrate(300) is prepared. A protrusion pattern(310) is selectively formed on the growth substrate. A semiconductor layer(320) is formed on the growth substrate and the protrusion pattern. The semiconductor layer is selectively removed by including the protrusion pattern. A dislocation(321) is located on the semiconductor layer grown on the growth substrate adjacent to the protrusion pattern.</p> |
申请公布号 |
KR101039970(B1) |
申请公布日期 |
2011.06.09 |
申请号 |
KR20100012759 |
申请日期 |
2010.02.11 |
申请人 |
LG INNOTEK CO., LTD. |
发明人 |
KANG, DAE SUNG;HAN, SANG HOON |
分类号 |
H01L33/04 |
主分类号 |
H01L33/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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