发明名称 METHOD FOR FORMING A SEMICONDUCTOR LAYER AND FABRICATING LIGHT EMITTING DEVICE
摘要 <p>PURPOSE: A method for forming a semiconductor layer and a method for manufacturing a light emitting device are provided to reduce dislocation in a semiconductor layer of a chip region by concentrically distributing the dislocation on a semiconductor layer of a scribing region. CONSTITUTION: A growth substrate(300) is prepared. A protrusion pattern(310) is selectively formed on the growth substrate. A semiconductor layer(320) is formed on the growth substrate and the protrusion pattern. The semiconductor layer is selectively removed by including the protrusion pattern. A dislocation(321) is located on the semiconductor layer grown on the growth substrate adjacent to the protrusion pattern.</p>
申请公布号 KR101039970(B1) 申请公布日期 2011.06.09
申请号 KR20100012759 申请日期 2010.02.11
申请人 LG INNOTEK CO., LTD. 发明人 KANG, DAE SUNG;HAN, SANG HOON
分类号 H01L33/04 主分类号 H01L33/04
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