APPLICATION METHOD OF NANOSTRUCTURE TO SUBSTRATE AND APPARATUS THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide an application method of more evenly applying a nanostructure to a substrate. SOLUTION: The application method of the nanostructure 1 to a substrate is provided wherein a nanostructural dispersion 2 is ejected from a first nozzle, with a facing plate 5 having at least one or more first nozzles 3 faced to a substrate 4 to be applied and parallel moved relative to the substrate. COPYRIGHT: (C)2011,JPO&INPIT