OMEGA SHAPED NANOWIRE FIELD EFFECT TRANSISTORS

摘要

A method for forming a nanowire field effect transistor (FET) device includes forming a nanowire (110) on a semiconductor substrate, (100) forming a first gate structure on a first portion of the nanowire, forming a first protective spacer (604) adjacent to sidewalls of the first gate structure and over portions of the nanowire extending from the first gate structure, removing exposed portions of the nanowire left unprotected by the first spacer, and epitaxially growing a doped semiconductor material (902) on exposed cross sections of the nanowire to form a first source region and a first drain region.