| 摘要 |
<p>Disclosed is a cleaning gas for deposits, which contains CHF2COF. The cleaning gas may contain O2, O3, CO, CO2, F2, NF3, Cl2, Br2, I2, XFn(wherein, X represents Cl, I or Br, and n represents an integer satisfying 1 = n = 7), CH4, CH3F, CH2F2, CHF3, N2, He, Ar, Ne, Kr and the like, and can be used for deposits that contain W, Ti, Mo, Re, Ge, P, Si, V, Nb, Ta, Se, Te, Mo, Re, Os, Ir, Sb, Ge, Au, Ag, As, Cr, compounds of such elements and the like. The cleaning gas is easily available and has excellent cleaning properties. In addition, the cleaning gas does not substantially by-produce CF4 that places a burden on the environment.</p> |
