摘要 |
<p>The exhaust gas aftertreatment device has an exhaust gas channel segment (20) and a supply element (22) for supplying an auxiliary medium (23) for supporting the aftertreatment. The exhaust gas channel segment is formed such that a mail flow of the exhaust gas drives a change in direction during through-flow of the exhaust gas channel segment at two units (24) that are arranged to each other in main flow direction.</p> |