| 摘要 |
<p>PURPOSE: A nozzle cleaning device, a substrate coating device including the same, and a nozzle cleaning method thereof are provided to prevent photoresist remaining on an outlet of a silt nozzle from being hardened by cleaning the outlet of the slit nozzle with a noncontact method. CONSTITUTION: A slit nozzle(110) spreads photoresist on the surface of a substrate(S). A nozzle cleaning device(120) cleans the outlet of the slit nozzle with a noncontact method. A plate(106) is arranged on one side of a base(102). The nozzle cleaning device and a preliminary discharge device(130) are arranged on the other side of the base in parallel. A bubbler generates bubbles with first cleaning solutions received in a first bath.</p> |
