发明名称 METHOD OF PLASMA CLEANING OF METAL SURFACE USING LOW FREQUENCY AND THE SUBSTRATE CLEANED BY THE METHOD
摘要 PURPOSE: A method for cleaning a metal surface with plasma using a low frequency and a manufacturing method thereof are provided to clean metal by generating hydrogen radical. CONSTITUTION: A bottom electrode(16) is prepared on the bottom of a chamber(10). A top electrode(17) is arranged on the upper side of the bottom electrode. A gas outlet(18) is formed on the top electrode to comprise a shower head. An exhaust port(31) is formed on the bottom of the chamber. A low frequency generator(15) transmits low frequency power to the chamber through the top electrode.
申请公布号 KR20110061031(A) 申请公布日期 2011.06.09
申请号 KR20090117543 申请日期 2009.12.01
申请人 PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION 发明人 KANG, CHUNG YUN;JO, SEUNG JAE;LEE, AH RUEM
分类号 H01L21/3065;H01L21/302 主分类号 H01L21/3065
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