METHOD OF PLASMA CLEANING OF METAL SURFACE USING LOW FREQUENCY AND THE SUBSTRATE CLEANED BY THE METHOD
摘要
PURPOSE: A method for cleaning a metal surface with plasma using a low frequency and a manufacturing method thereof are provided to clean metal by generating hydrogen radical. CONSTITUTION: A bottom electrode(16) is prepared on the bottom of a chamber(10). A top electrode(17) is arranged on the upper side of the bottom electrode. A gas outlet(18) is formed on the top electrode to comprise a shower head. An exhaust port(31) is formed on the bottom of the chamber. A low frequency generator(15) transmits low frequency power to the chamber through the top electrode.
申请公布号
KR20110061031(A)
申请公布日期
2011.06.09
申请号
KR20090117543
申请日期
2009.12.01
申请人
PUSAN NATIONAL UNIVERSITY INDUSTRY-UNIVERSITY COOPERATION FOUNDATION