| 摘要 |
According to one embodiment of a substrate measuring method, a shape of a unit structure is measured by making an electromagnetic wave incident on a periodical structure and detecting a scattered electromagnetic wave. Measurement conditions are determined through calculation of a scattering profile representing the distribution of scattering intensities of the electromagnetic wave and optimization corresponding to a comparison result obtained by comparing the scattering profile every time a value of a parameter of attention is changed.
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