发明名称 |
THIN-FILM PRODUCTION METHOD AND THIN-FILM ELEMENT |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a thin-film production method capable of producing a thin film having a stable quality at a low cost. <P>SOLUTION: The thin-film production method has a disposing process for disposing a substrate 20 in a raw material solution of a thin film to be formed on the substrate 20 and a first forming process for forming a thin film on a first main face 20a of the substrate 20 by irradiating a first light having a wavelength by which a light absorbing rate of a solvent in the raw material solution becomes a predetermined threshold value or more from a first light source 13 and by irradiating a second light having a wavelength by which a light absorbing rate of the solvent becomes lower than that of the first light by the solvent from a second light source 14. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
申请公布号 |
JP2011114087(A) |
申请公布日期 |
2011.06.09 |
申请号 |
JP20090267905 |
申请日期 |
2009.11.25 |
申请人 |
RICOH CO LTD |
发明人 |
YAGI MASAHIRO;OTA HIDEKAZU |
分类号 |
H01L21/316;H01L41/187;H01L41/317;H01L41/39 |
主分类号 |
H01L21/316 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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