发明名称 THIN-FILM PRODUCTION METHOD AND THIN-FILM ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a thin-film production method capable of producing a thin film having a stable quality at a low cost. <P>SOLUTION: The thin-film production method has a disposing process for disposing a substrate 20 in a raw material solution of a thin film to be formed on the substrate 20 and a first forming process for forming a thin film on a first main face 20a of the substrate 20 by irradiating a first light having a wavelength by which a light absorbing rate of a solvent in the raw material solution becomes a predetermined threshold value or more from a first light source 13 and by irradiating a second light having a wavelength by which a light absorbing rate of the solvent becomes lower than that of the first light by the solvent from a second light source 14. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011114087(A) 申请公布日期 2011.06.09
申请号 JP20090267905 申请日期 2009.11.25
申请人 RICOH CO LTD 发明人 YAGI MASAHIRO;OTA HIDEKAZU
分类号 H01L21/316;H01L41/187;H01L41/317;H01L41/39 主分类号 H01L21/316
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