发明名称 METHOD AND APPARATUS FOR RECOVERING INDIUM FROM ETCHING WASTE SOLUTION CONTAINING INDIUM AND FERRIC CHLORIDE
摘要 An object is to provide a method and an apparatus for recovering indium, the method and apparatus ensuring that it is unnecessary to recover indium in the form of indium hydroxide, indium can be recovered at a high concentration, indium can be recovered easily by a filter or the like without handling inferiors and also, the recovery rate of indium is greatly improved. The method includes adding a precipitation-inducing metal including a metal having higher ionization tendency than indium to an etching waste solution containing at least indium and ferric chloride, in which the concentration of ferric chloride is adjusted to 20% by weight or less to thereby precipitate indium contained in the etching waste solution on the surface of the precipitation-inducing metal, then, detaching the indium precipitated on the precipitation-inducing metal from the precipitation-inducing metal by a detaching means and separating the detached solid indium or indium alloy from the solution to recover the indium.
申请公布号 US2011132146(A1) 申请公布日期 2011.06.09
申请号 US20070524081 申请日期 2007.11.19
申请人 SHARP KABUSHIKI KAISHA;KOBELCO ECO-SOLUTIONS CO., LTD., 发明人 MIKI TAKEO;SUGIMOTO TAMOTSU;SAHASHI EIICHI;HONMA TAKAMICHI;MAESETO TOMOHARU
分类号 C22B11/00;C22B3/02 主分类号 C22B11/00
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