摘要 |
Methods and apparatus for treating an exhaust gas in a foreline of a substrate processing system are provided herein. In some embodiments, an apparatus for treating an exhaust gas in a foreline of a substrate processing system includes a plasma source coupled to a foreline of a process chamber, a reagent source coupled to the foreline upstream of the plasma source, and a foreline gas injection kit coupled to the foreline to controllably deliver a gas to the foreline, wherein the foreline injection kit includes a pressure regulator to set a foreline gas delivery pressure setpoint, and a first pressure gauge coupled to monitor a delivery pressure of the gas upstream of the foreline. |
申请人 |
APPLIED MATERIALS, INC.;DICKINSON, COLIN, JOHN;MOALEM, MEHRAN;CLARK, DANIEL, O. |
发明人 |
DICKINSON, COLIN, JOHN;MOALEM, MEHRAN;CLARK, DANIEL, O. |