发明名称 DAMAGE PROPAGATION BARRIER
摘要 A conductor-filled damage propagation barrier is formed extending into a low-k dielectric layer between a fuse and an adjacent circuit element for preventing propagation of damage during a fuse blow operation. Conductor material filling the damage propagation barrier is formed from the same conductor layer as that used to form an interconnect structure.
申请公布号 US2011133307(A1) 申请公布日期 2011.06.09
申请号 US201113028332 申请日期 2011.02.16
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 DAUBENSPECK TIMOTHY H.;GAMBINO JEFFREY P.;MUZZY CHRISTOPHER D.;SAUTER WOLFGANG
分类号 H01L23/62 主分类号 H01L23/62
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