发明名称 METHOD FOR MANUFACTURING VARIABLE-RESISTANCE MEMORY DEVICE AND VARIABLE RESISTANCE MEMORY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for forming a heating electrode of a variable-resistance memory device having a phase-variable matter film and a variable-resistance memory utilizing it. SOLUTION: The method for manufacturing the variable-resistance memory device includes steps to form the heating electrode, to form a variable-resistance matter film on the heating electrode, and to form an upper electrode on the variable resistance matter film. The heating electrode contains a metal nitride which is bigger than titanium in a radius of an atom and formed of a chemical vapor deposit ( thermal CVD ) without using plasma. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011114344(A) 申请公布日期 2011.06.09
申请号 JP20100261769 申请日期 2010.11.24
申请人 SAMSUNG ELECTRONICS CO LTD 发明人 PARK YOUNG-LIM;LEE JIN-IL;AHN DONG HUL;RI SHIKEI;OH GYUHWAN
分类号 H01L27/105;H01L45/00 主分类号 H01L27/105
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