| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus which reduces worker's working burden, a control device for controlling the substrate processing apparatus, and a method of processing a substrate using the apparatus and the control device. SOLUTION: The substrate processing apparatus includes processing chambers belonging to a first group for executing a first processing method, processing chambers belonging to a second group for executing a second processing method, and a transportation means for transporting a substrate to the processing chamber. In such a substrate processing apparatus, a processing method input by a worker is acquired (step S3), and the transportation means is controlled (steps S4 to S6) so that the substrate is transported to one of the processing chambers belong to the first group when the processing method input by the worker is the first processing method, and so that the substrate is transported to one of the processing chambers belong to the second group when the processing method input by the worker is the second processing method. COPYRIGHT: (C)2011,JPO&INPIT
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