发明名称 METHOD OF MANUFACTURING A SUBSTRATE FOR A MICROELECTRONIC DEVICE, AND SUBSTRATE FORMED THEREBY
摘要 A method of manufacturing a substrate for a microelectronic device comprises providing a dielectric material (120, 220, 920) as a build-up layer of the substrate, applying a primer (140, 240, 940) to a surface (121, 221, 921) of the dielectric material, and forming an electrically conductive layer (150, 250, 950) over the primer. In another embodiment, the method comprises providing the dielectric material, forming the feature extending into the dielectric material, forming the electrically conductive layer over the dielectric material, applying the primer to a surface of the electrically conductive layer and attaching a dielectric layer (960) to the primer.
申请公布号 US2011135883(A1) 申请公布日期 2011.06.09
申请号 US201113029346 申请日期 2011.02.17
申请人 JOMAA HOUSSAM;ALUR AMRUTHAVALLI P;SENEVIRATNE DILAN 发明人 JOMAA HOUSSAM;ALUR AMRUTHAVALLI P.;SENEVIRATNE DILAN
分类号 B32B3/30 主分类号 B32B3/30
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