DUAL PATTERNING METHOD FOR SUBSTRATE USING ATMOSPHERIC PRESSURE PLASMA

摘要

PURPOSE: A dual patterning method of a substrate using atmospheric pressure plasma is provided to simultaneously form a hydrophobic pattern and a hydrophilic pattern on the substrate below several micro meters by selectively discharging atmospheric plasma. CONSTITUTION: A substrate is provided to an atmospheric pressure plasma device including a first electrode and a second electrode(S100). A hydrophobic pattern is formed on the substrate by discharging the atmospheric pressure plasma between the first electrode and the second electrode(S110). The substrate is transferred between the first electrode and the second electrode(S120). A hydrophilic pattern is formed on the substrate by discharging atmospheric pressure plasma between the first electrode and the second electrode(S130).