发明名称 Liquid precursor for depositing group 4 metal containing films
摘要 The present invention relates to a family of liquid group 4 precursors represented by the formula: (pyr*)M(OR 1 )(OR 2 )(OR 3 ), wherein pyr* is an alkyl substituted pyrrolyl, M is a group 4 metal, and R 1-3 can be same or different and are selected from linear or branched C 1-6 alkyls. It also relates to a family of Group 4 precursors represented by the formula: (pyr*)(Cp)M(OR 1 )(OR 2 ), wherein pyr* is an alkyl substituted pyrrolyl, Cp is cyclopentadienyl or alkyl substituted cyclopentadienyl, and M and R 1-2 are as previously defined. Preferred precursors include: (2,5-di-tert-butylpyrrolyl)(tris(ethoxy)titanium; (2,5-di-tert-amylpyrrolyl)(tris(ethoxy)titanium; (2,5-di-tert-amylpyrrolyl)(tris(iso-propoxy)titanium; and (cyclopentadienyl)(2,5-dimethylpyrrolyl)(bis(ethoxy))titanium.
申请公布号 EP2330109(A1) 申请公布日期 2011.06.08
申请号 EP20100193948 申请日期 2010.12.07
申请人 US 发明人 US;US;US
分类号 C07F7/00;C07F17/00;C23C16/455 主分类号 C07F7/00
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