发明名称 Transistor, method of manufacturing the transistor and electronic device including the transistor
摘要 Provided are a transistor, a method of manufacturing the transistor, and an electronic device including the transistor. The transistor may include a passivation layer on a channel layer, a source, a drain, and a gate, wherein the component of the passivation layer is varied in a height direction. The passivation layer may have a multi-layer structure including a silicon oxide layer, a silicon oxynitride layer, and a silicon nitride layer sequentially stacked. The channel layer may include an oxide semiconductor.
申请公布号 EP2330629(A1) 申请公布日期 2011.06.08
申请号 EP20100193027 申请日期 2010.11.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 JUNG, JI-SIM;LEE, CHANG-SEUNG;LE, JAE-CHEOL;LEE, SANG-YOON;KWON, JANG-YEON;LEE, KWANG-HEE;SON, KYOUNG-SEOK
分类号 H01L29/786 主分类号 H01L29/786
代理机构 代理人
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