| 摘要 |
In order to remove dust on a mounting stage, on which a subject to have a film deposited thereon is placed, with no influence of a chamber cover vertically moving in association with opening and closing a chamber for a covered vapor deposition apparatus, a vapor deposition apparatus comprises a chamber (1) configured of a chamber main body (4) and a chamber cover (6), a substrate tray mounting stage (9) disposed in the chamber (1), a rotating mechanism (11) for rotating the substrate tray mounting stage (9) about the center axis (O) of the chamber (1), and a cleaning means (2) for removing dust on the substrate tray mounting stage (9). The cleaning means (2) includes outside the chamber (1) a moving mechanism (23) having an arm (22) extended toward the substrate tray mounting stage (9), a suction nozzle (21) disposed on one end of the arm (22), and a first rotating shaft part (25) extended in a first direction parallel with the center axis (O). The arm (22) is rotated about the first rotating shaft part (25) for moving the suction nozzle (21) into the chamber (1) and vice versa. |
