发明名称 |
SUBSTRATE HOLDING DEVICE, EXPOSURE DEVICE, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD |
摘要 |
The present invention provides a substrate holding apparatus that comprises: a base part; a support part (81) that is formed on the base part and supports a rear surface of the substrate (P); a first circumferential wall (31) that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate (P), which is supported by the support part (81); and surrounds a first space (41) that is between the substrate (P), which is supported by the support part (81), and the base part; a second circumferential wall (32) that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate (P), which is supported by the support part (81), with a gap interposed therebetween; and surrounds the first circumferential wall (31); a third circumferential wall (33) that: is formed on the base part; has a third upper surface that opposes the rear surface of the substrate (P), which is supported by the support part (81); and surrounds the support part (81) and the second circumferential wall (32); a fluid flow port (60) that is capable of supplying gas to a second space (42) that is between the first circumferential wall (31) and the second circumferential wall (32); and a first suction port (61) that suctions fluid from a third space (43) that is between the second circumferential wall (32) and the third circumferential wall (33). |
申请公布号 |
EP1962329(A4) |
申请公布日期 |
2011.06.08 |
申请号 |
EP20060834307 |
申请日期 |
2006.12.08 |
申请人 |
NIKON CORPORATION |
发明人 |
MIZUTANI, TAKEYUKI;SHIBAZAKI, YUICHI;SHIBUTA, MAKOTO |
分类号 |
H01L21/687;G03F7/20 |
主分类号 |
H01L21/687 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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