| 摘要 |
PURPOSE: A substrate processing device is provided to improve the stability and efficiency of work by automatically opening a door on one side of a process chamber. CONSTITUTION: A process chamber(100) processes a substrate. An opening(150) is installed on one side of the process chamber. A door(200) opens and closes the opening. The opening is closed by combining the door with the process chamber using magnetic force. An electro magnet is formed on one side of the process chamber or the door.
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