发明名称 |
METHOD AND STRUCTURE FOR ADHESION OF INTERMETALLIC COMPOUND (IMC) ON CU PILLAR BUMP |
摘要 |
<p>PURPOSE: A method and a structure for bonding inter-metallic compound on a copper filler-based bump are provided to constantly maintain a gap between a die and a substrate using pillar shaped bumps. CONSTITUTION: A copper-containing filler layer(108) is formed. A diffusion barrier(110) is formed on the copper-containing filler layer. A copper-containing cap layer(112) is formed on the diffusion barrier. A solder layer(114) is formed on the copper-containing cap layer. The copper-containing cap layer and the solder layer are thermally processed in order to form inter-metallic compound.</p> |
申请公布号 |
KR20110002816(A) |
申请公布日期 |
2011.01.10 |
申请号 |
KR20100063691 |
申请日期 |
2010.07.02 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN JING CHENG;YU CHEN HUA |
分类号 |
H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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