发明名称 METHOD AND STRUCTURE FOR ADHESION OF INTERMETALLIC COMPOUND (IMC) ON CU PILLAR BUMP
摘要 <p>PURPOSE: A method and a structure for bonding inter-metallic compound on a copper filler-based bump are provided to constantly maintain a gap between a die and a substrate using pillar shaped bumps. CONSTITUTION: A copper-containing filler layer(108) is formed. A diffusion barrier(110) is formed on the copper-containing filler layer. A copper-containing cap layer(112) is formed on the diffusion barrier. A solder layer(114) is formed on the copper-containing cap layer. The copper-containing cap layer and the solder layer are thermally processed in order to form inter-metallic compound.</p>
申请公布号 KR20110002816(A) 申请公布日期 2011.01.10
申请号 KR20100063691 申请日期 2010.07.02
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIN JING CHENG;YU CHEN HUA
分类号 H01L21/60 主分类号 H01L21/60
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