发明名称 |
METHOD FOR COLOR FILTER OF SOLID STATE IMAGING DEVICE, COLOR FILTER BY THE METHOD AND SOLID STATE IMAGING DEVICE INCLUDING THEREOF |
摘要 |
PURPOSE: The color filter manufactured with the manufacturing method of the color filter for the solid imaging device using the ultrashort wavelength exposure, and the method thereof and solid imaging device including the same forms the minute colored pattern into the limit resolution lowing. CONSTITUTION: By coating each color coloured photosensitive resin composition including the photopolymerization initiator reacting to the ultra-high frequency less than 300nm in the top of the substrate film is formed(S1). The ultrashort wavelength laser less than 300nm becomes in the formation area of the colored pattern of film with Joshi by using the ultrashort wavelength exposure having the numerical aperture more than 0.6(S2).
|
申请公布号 |
KR20110002605(A) |
申请公布日期 |
2011.01.10 |
申请号 |
KR20090060146 |
申请日期 |
2009.07.02 |
申请人 |
DONGWOO FINE-CHEM CO., LTD. |
发明人 |
LEE, SANG HAENG;KIM, SANG TAE;KIM, SEONG HYOEUN |
分类号 |
G02B5/20;G03F7/20 |
主分类号 |
G02B5/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|