| 摘要 |
PURPOSE: An ultrasonic wave-based cleaner is provided to improve the elimination capability of particles by applying a radius directional movement, a circumference directional movement, or a rotational movement to an oscillator. CONSTITUTION: A variable gap part is formed at a lower surface of an oscillator(260). The lower surface of the oscillator corresponds to a wafer. The variable gap part includes a plurality of protrusions(262) which is composed of a plurality of lines. The cross section of the protrusions is formed into a round pillar shape. A horizontal transferring part is installed to the oscillator which linearly moving the oscillator on a horizontal face.
|
