发明名称 APPARATUS AND METHOD FOR TREATING SUBSTRATE
摘要 PURPOSE: An apparatus and a method for processing substrates are provided to prevent the generation of particles due to the friction/abrasion of a rotary supporting unit by rotating, aligning, and supporting a rotary shaft in contact with a spin chuck using a non-contact method. CONSTITUTION: A processing chamber(100) includes a space in which a substrate processing process is implemented. A spin chuck(400) chucking a substrate is arranged in the processing chamber. A rotary driving unit rotates the spin chuck. The rotary driving unit comprises a driving magnetic substance. The driving magnetic substance faces a driven magnetic substance in the radial direction of a rotary shaft(510). The rotary driving unit comprises a driving unit(530) rotating the driving magnetic substance around the rotary shaft.
申请公布号 KR20110002685(A) 申请公布日期 2011.01.10
申请号 KR20090060273 申请日期 2009.07.02
申请人 SEMES CO., LTD. 发明人 LEE, SE WON;BAE, JEONG YONG
分类号 H01L21/683 主分类号 H01L21/683
代理机构 代理人
主权项
地址