发明名称 Semiconductor photodetector device
摘要 A transmitted light absorption/recombination layer, a barrier layer, a wavelength selection/absorption layer, and an InP window layer having a p-type region are supported by an n-type substrate and arranged in that order. Light with a wavelength of 1.3 μm reaches the wavelength selection/absorption layer through the InP window layer. Then, the light is absorbed by the wavelength selection/absorption layer and drawn from the device as an electric current signal. Light with a wavelength of 1.55 μm reaches the transmitted light absorption/recombination layer through the barrier layer. Then, the light is absorbed by the transmitted light absorption/recombination layer, generating electrons and holes. These electrons and holes recombine with each other and, hence, disappear.
申请公布号 US7851823(B2) 申请公布日期 2010.12.14
申请号 US20080098543 申请日期 2008.04.07
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 ISHIMURA EITARO
分类号 H01L31/107 主分类号 H01L31/107
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