发明名称 |
Double-layer shutter control method of multi-sputtering system |
摘要 |
A double-layer shutter control method of a multi-sputtering system provided with three targets in a single chamber and a double-layer rotating shutter mechanism having shutter plates which independently rotate and have holes formed therein, comprising selecting a target by a combination of holes of a first shutter plate and a second shutter plate and uses the selected target for a pre-sputtering step and a main sputtering step with continuous discharge so as to deposit a film on a substrate, whereby it is possible to prevent cross-contamination between targets due to target substances etc. deposited on the shutter plates.
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申请公布号 |
US7850827(B2) |
申请公布日期 |
2010.12.14 |
申请号 |
US20050078549 |
申请日期 |
2005.03.14 |
申请人 |
CANON ANELVA CORPORATION |
发明人 |
NOMURA SHUJI;MIYOSHI AYUMU;MIKI HIROSHI |
分类号 |
C23C14/22;C23C14/34;C23C14/32;C23C14/54;C23C14/56 |
主分类号 |
C23C14/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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