发明名称 Semiconductor device and method for manufacturing the same
摘要 A semiconductor device including a semiconductor substrate is provided. The semiconductor substrate includes a substrate having an insulating surface, and a plurality of stacks over the substrate having an insulating surface. Each of the plurality of stacks includes a bonding layer over the substrate having an insulating surface, an insulating layer over the bonding layer, and a single crystal semiconductor layer over the insulating layer. The substrate having an insulating surface has a depression, and the depression is provided between one of the plurality of stacks and another adjacent one of the plurality of stacks.
申请公布号 US7851332(B2) 申请公布日期 2010.12.14
申请号 US20080237606 申请日期 2008.09.25
申请人 SEMICONDUCTOR ENERGY LABORATORY CO., LTD. 发明人 YAMAZAKI SHUNPEI;KOEZUKA JUNICHI;KAKEHATA TETSUYA
分类号 H01L21/00 主分类号 H01L21/00
代理机构 代理人
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