摘要 |
An exposure apparatus that comprises a stage-that moves in the X-axis direction, an X-axis linear motor that drives the stage, a counter mass that moves in a direction opposite to the stage due to the action of the reaction force of the drive force of the stage in the X-axis direction by the motor, X-axis trim motors that drives the counter mass in the X-axis direction, and a control unit that controls the trim motors and gives the counter mass an initial velocity in the +X direction when the stage is moved via the motor, for example, in the +X direction. Accordingly, the strokes required for the movement of the counter mass can be shortened without increasing the size of the counter mass.
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