发明名称 Transistor
摘要 A transistor includes a nitride semiconductor layer and a gate electrode layer. The gate electrode layer includes a tantalum nitride layer on the nitride semiconductor layer. The tantalum nitride layer forms a Schottky junction with the nitride semiconductor layer. The transistor also includes an insulating film on the nitride semiconductor layer. The insulating film surrounds the gate electrode layer. A first portion of the gate electrode layer, in contact with the nitride semiconductor layer, has a higher nitrogen mole fraction than a second portion of the gate electrode layer.
申请公布号 US7851831(B2) 申请公布日期 2010.12.14
申请号 US20070859846 申请日期 2007.09.24
申请人 MITSUBISHI ELECTRIC CORPORATION 发明人 KOYAMA HIDETOSHI;KAMO YOSHITAKA;SHIGA TOSHIHIKO
分类号 H01L29/66;H01L29/00 主分类号 H01L29/66
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