| 摘要 |
A process manufactures a probe intended to interact with a storage medium of a probe-storage system, wherein a sacrificial layer is deposited on top of a substrate; a hole is formed in the sacrificial layer; a mold layer is deposited; the mold layer is etched via the technique for forming spacers so as to form a mold region delimiting an opening having an area decreasing towards the substrate. Then a stack of conductive layers is deposited on top of the sacrificial layer, the stack is etched so as to form a suspended structure, formed by a pair of supporting arms arranged to form a V, and an interaction tip projecting monolithically from the supporting arms. Then a stiffening structure is formed, of insulating material, and the suspended structure is fixed to a supporting wafer. The substrate, the sacrificial layer, and, last, the mold region are then removed.
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